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Ultratech 602 Mask Cleaner by SitekProcess
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Product Description
Ultratech 602 Mask /wafer Cleaner* EQP-00854-SI
* Uses high pressure DI water jets to clean
particles from photomasks.
* Heat lamp for drying. 120V, 60 Hz.
* System can be configured for multiple mask sizes.
* Currently set up for 5" square masks
* Can be configures at additional charge with a
contact brush scrub.
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