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Lam Research 4520 Rainbow Oxide Etcher by Global Nanotech Equipment
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Product Description
* Configured for 6" wafers
* Classic control system
* Bulkhead mount system
* Momentary EMO
* Hine 38A open cassette SEND indexer
* Belt driven load station
* Standard load station shuttle spatula
* 6-gas box configuration
* Standard gas box
* Rear gas panel exhaust
* [5Ra] gas weldment polish
* Unit mass flow controllers
Gas 1: Ar (1 slm)
Gas 2: CF4 (50 sccm)
Gas 3: CHF3 (50 sccm)
Gas 4: He (1 slm)
Gas 5: Ar (200 sccm)
Gas 6: N2 (100 sccm)
UPC: He (50 sccm)
* AC input box (fuses)
* 400 Khz RF power frequency
* AE PDW-2200 RF generator on cart
* 6" entrance loadlock wafer holder (Tight-pocket)
* Variable upper chamber gap
* LoFAT RF power tuning
* Silicon upper chamber electrode
* 6" lower chamber electrode (Non-ESC)
* TAC for lower chamber wafer clamping
* Single chamber monochromators
* Non-heated endpoint window
* Low pressure chamber manifolding
* HPS valve for chamber isolation
* AC-2 chamber pressure control
* 10 Torr chamber manometer
* 10 Torr wafer area pressure manometer
* 100 Torr backside He manometer
* 6" exit loadlock wafer holder
* Hine 38A RECEIVE indexer
* 3-light Light Tower
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