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PLASMA-THERM SYSTEM VII Tabletop RIE or PECVD Reactive Ion Etcher by Bid-Service, LLC
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Product Description
Tabletop RIE or PECVD Reactive Ion Etcher with Turbo Pump option Convertible to PECVD System. PC controller, old PC but sold in good working condition. System can be converted between RIE and PECVD. Electrode holds wafers up to 200mm. Four process gas inputs each with MFC mass flow controllers. Turbo pump and corrosive series vacuum pumps. 500W 13.56 MHz RF Generator with matching network. Gas input via shower head. Last used O2, CHF3, CF4, SF6.
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