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Matrix 303 Etcher by SitekProcess
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Product Description
Matrix 303 Etcher*Programmable microprocessor controlled system
*Capable of handling wafer sizes from 2 in. to 6 in
*Cassette loading
*ENI OEM-6XL 13.56 Mhz
*600W RF Generator
*Temperature controlled
*Previous gases used: NF3, O2, N2, He. 200/240V, 1 Ph, 50/60 Hz
*Used for Isotropic etches such as Nitride, Poly and Oxides
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