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Matrix 303/403 Plasma Etcher System by Allwin21 Corp.
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Product Description
Manufacturer:Matrix Integrated Systems
Model : Matrix 303
Matrix is a Registered Trademark of Matrix Integrated Systems, Inc.The model Matrix303 is an electro-mechanical production system used to down stream etch materials such as nitride, oxide poly-silicon etc. from the surface of silicon or other substrate. Each wafer is processed individually by means a chemical reaction induced by a gas plasma.
Single Wafer, Multi-Step Processing
- Closed-Loop Temperature Control
- Pressure Control
- Accurate, closed-loop pressure control with ¡°butterfly-style¡± throttle valve and capacitance manometer
- RF power: 100 to 500 watts
- Timed cycles up to 4 hour each
Matrix 303 consists of the following major assemblies.
Main Console:
Process Model,
Operator interface Model,
Wafer Transport Module,
Elevator Module,
PC Control Module.
Power Supply Console:
RF Generator,
DC Supply,
AC Distribution,
Gas Distribution panel,
Temperature/Pressure Control Module.
Vacuum Pump (optional):
Vacuum Hose and Connector, Ballast Assembly.
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